SjoerdRoorda

Ion beam modification and analysis of materials

The tandem accelerators (1.7 and 6 MV) will be used to irradiate a sample, which can be a semiconductor, insulator, magnetic or optical material, etc., with the aim to modify or analyse some property. This method of materials modification is called ion implantation, and can be used for doping, to introduce defects into a materials, or even to make a material amorphous. Materials analysis is done either with the accelerators, for example by RBS (Rutherford Backscattering Spectrometry) or channeling or elsewhere on campus using another one of the GCM laboratories. These projects are available for undergraduate students in the physics department of the Université de Montréal.

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